A few uncollected particles or gas molecules can have extremely serious consequences in some processes. Just imagine what harm contaminated air could do to the manufacture of semiconductors, hard disks and to other highly sensitive processes.
In semiconductor manufacturing, front end advanced production methods demand very clean air supply with cleanliness requirements constantly increasing. The critical particle size for wafer environment is now below 25 nm (2009) and predictions are made that this size will continue to shrink towards 10 nm by 2017. Airborne molecular contamination (AMC) is now a major issue for all advanced microelectronic fabs. A wide range of AMC effects have been observed impacting production yield. For instance acidic corrosion of hard disks or wafers, condensable organic deposition on sensitive surfaces or exposure to low levels of ammonia have all been shown to affect diverse process steps.
The heart of the cleanroom is its filters, but there are a number of considerations regarding room classification, choice of filter, and how filters influence the environment.
SAF is well positioned to recommend the best solution for advanced particle and AMC control thanks to more than 16 years experience in the field of microelectronics and semiconductor contamination control, and through our involvement in the International Technology Roadmap for Semiconductors.
HEPA, ULPA and molecular filters are produced within controlled environments in SAF’s ISO 9000 certified plants. We can produce the same type of filters at multiple manufacturing sites. Our large production capacity ensures the availability of our products at all times throughout the world.